Compact KB systems
Specific to micro and nano-focusing beamlines
- High optical performances
- Compact and flexible design
- High stability
- UHV compliant
Specific to micro and nano-focusing beamlines
- High optical performances
- Compact and flexible design
- High stability
- UHV compliant
Compact KB systems
Specific to micro and nano-focusing beamlines
- High optical performances
- Compact and flexible design
- High stability
- UHV compliant
Specific to micro and nano-focusing beamlines
- High optical performances
- Compact and flexible design
- High stability
- UHV compliant
IRELEC proposes a highly compact Kirkpatrick-Baez mirror system designed to produce high quality focused x-ray beams.
Fully compatible with UHV environments, this highly stable system includes:
- A compact IRELEC bender version
- Backlash-free high precision individual pitch rotation stages
- UHV precision linear micro-actuator for fine mirror position control
- Optional translation stages for multi-stripe mirrors
Specifications
Focal distance
< 150 mm
Elliptical profile error (bent)
< 100 nrad rms
Individual pitch adjustment resolution
0.4 µrad
First Eigen frequency
> 130 Hz
Typical dimensions (L × W × H)
400 × 300 × 250 mm
Weight
< 25 kg
UHV compatibility
Yes
Translation stage(s)
Optional
References
| DIAD (K11) beamline at DLS |
|---|